Tetramethyl ammonium hydroxide can be used as an etchant

Tetramethyl ammonium hydroxide is a commonly used etchant, particularly widely used in the manufacturing process of integrated circuits and microelectronic devices. The followings are some applications of Tetramethylammonium hydroxide in etchants:

 

• Etch silicon: Tetramethyl ammonium hydroxide can be used to etch silicon surfaces, especially suitable for preparing micron level silicon device structures. Tetramethyl ammonium hydroxide can selectively etch silicon, while for other materials such as silicon nitride or metals, it has a lower etching rate.
• Etch glass: Tetramethyl ammonium hydroxide  can be used to etch the surface of glass and is typically used to prepare microfluidic chips or microchannel devices. TMAH can efficiently etch glass materials into desired structural shapes, such as micron level channels, pores, or reaction cavities.
• Etch Metal: Although Tetramethyl ammonium hydroxide has a relatively low etching rate on metals, it can be used to etch metals in certain applications. For example, it can be used to remove oxide layers from metal surfaces for subsequent metal deposition or bonding.

 

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